Ion beams and their applications in high-resolution probe formation

IEEE Transactions on Plasma Science

Volumn 33, Issue 6 I, 2005, Pages 1911-1930

  Guharay, S K ^a   Orloff, J ^b   Wada, M ^c  

^a FM Technologies Inc   (United States)

^b The Institute for Research in Electronics and Applied Physics   (United States)

^c DOSHISHA UNIVERSITY   (Japan)

Author keywords

Applications; Beam focusing; High resolution; Ion beams; Plasma sources; Point sources

Indexed keywords

CURRENT DENSITY; ION SOURCES; IONIZATION; LIQUID METALS; MATHEMATICAL MODELS; NEGATIVE IONS; PLASMA SOURCES; PROBES;

BEAM BRIGHTNESS; BEAM FOCUSING; HIGH RESOLUTION; LIQUID METAL ION SOURCE; POINT SOURCES; SURFACE PLASMA SOURCE;

ION BEAMS;

EID: 30544452705     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2005.860086     Document Type: Review

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