Characterization of multicusp-plasma ion source brightness using micron-scale apertures

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2602-2606

  Scott, K L ^a,c   King, T J ^a,c   Leung, K N ^a   Pease, R F ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Stanford University   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGED PARTICLES; CURRENT DENSITY; ELECTRON BEAMS; ION SOURCES; OPTICAL PROPERTIES; PLASMA SOURCES;

BRIGHTNESS; MULTICUSP PLASMA ION SOURCE;

ION BEAM LITHOGRAPHY;

EID: 0035519173     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1414019     Document Type: Article

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