New developments for shallow depth profiling with the Cameca IMS 6f

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 529-532

  Schuhmacher, M ^a   Rasser, B ^a   Desse, F ^a  

^a CAMECA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; ION BEAMS; PHOSPHORUS;

ACCEL-DECEL SYSTEMS; DUOPLASMATRON SOURCES;

SECONDARY ION MASS SPECTROMETRY;

EID: 0033681443     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591226     Document Type: Article

References (4)

1. Z. X. Jiang and P. F. A. Alkemade, Appl. Phys. Lett. 73, 315 (1998).
2. C. W. Magee, G. R. Mount, S. P. Smith, B. Herner, and H. J. Gossmann, XIIth International Conference on Ion implantation Technology, 1998.
3. P. A. Ronsheim, S. Patel, and M. Schuhmacher, SIMS XI Conference Proceedings, 1997, pp. 301-304.
4. M. Schuhmacher, B. Rasser, and D. Renard, SIMS XI Conference Proceedings, 1997, pp. 695-698.