A new approach to pattern metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 51-65

  Ausschnitt, Christopher P ^a,b  

^a IBM RESEARCH   (United States)

^b NONE   (United States)

Author keywords

Critical dimension; Etch; Film thickness; Integrated metrology; Lithography; Overlay; Process control

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALIBRATION; ERROR ANALYSIS; ETCHING; LITHOGRAPHY; OPTICAL MICROSCOPY; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SCATTERING; SIGNAL TO NOISE RATIO; THICKNESS MEASUREMENT;

CRITICAL DIMENSIONS (CD); FILM THICKNESS; INTEGRATED METROLOGY; OVERLAY;

MICROELECTRONICS;

EID: 2942648265     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.539143     Document Type: Conference Paper

References (14)

1. Apologies to J.R.R. Tolkien,"Lord of the Rings."
2. C. P. Ausschnitt, et al, "Process Window Metrology," Proc. SPIE, 3998 (2000) pp. 158-166
3. S. Hannon, et al, "Product-wafer focus-exposure monitor for advanced flash memory," Microlithography World, 13 (February, 2004) pp. 5-9.
4. H-T Huang, et al, "Scatterometry-Based Overlay Metrology," Proc. SPIE, 5038 (2003) pp. 126-137
5. W. Yang, et al, "A novel diffraction based spectroscopic method for overlay metrology," Proc. SPIE, 5038 (2003) pp. 200-207.
6. C.P. Ausschnitt, "From Compliance to Control - Off Road-Map Metrology for Low-k Lithography," Proc. SPIE, 4344 (2001).
7. C. P. Ausschnitt, "CD Control of Low k-Factor Step-and-Scan Lithography," Proc. SPIE, 4346 (2001).
8. M. Asano, et al, "Run-to-Run CD Error Analysis and Control with Monitoring of Effective Dose and Focus," Proc. SPIE, 5038 (2003) pp. 239-246.
9. C. P. Ausschnitt, "Distinguishing Dose and Defocus for In-Line Lithography Control," Proc. SPIE, 3677 (1999) pp. 140-147.
10. A. Starikov, "Exposure Monitor Structure," Proc. SPIE 1261 (1990) pp. 315-324.
11. T. A. Brunner, et al, "Quantitative stepper metrology using the focus monitor test mask," Proc. SPIE 2197 (1994) p. 541.
12. K. Izuha, et al, "Novel in situ focus monitor technology in attenuated PSM," Proc. SPIE 5040 (2003) pp. 590-595.
13. C.P. Ausschnitt, S. Y. Cheng, "Modeling for Profile-Based Process Window Control," Proc. SPIE, 5078 (2004), Santa Clara, CA.
14. J. Bischoff, et al, "Light Diffraction Based Overlay Measurement," Proc. SPIE 4344 (2001) pp. 222-233.