Process window metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 158-166

  Ausschnitt, Christopher P ^a   Chu, William ^a   Hadel, Linda ^a   Ho, Ho,k ^a   Talvi, Peter ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL VARIABLES CONTROL; OPTICAL VARIABLES MEASUREMENT; SIGNAL TO NOISE RATIO;

OPTICAL CRITICAL DIMENSIONS (OCD); PROCESS WINDOW METROLOGY (PWM);

PHOTOLITHOGRAPHY;

EID: 0033687635     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)