A novel diffraction based spectroscopic method for overlay metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 200-207

  Yang, Weidong ^a   Lowe Webb, Roger ^a   Rabello, Silvio ^a   Hu, Jiangtao ^a   Lin, Je Yi ^a   Heaton, John ^a   Dusa, Mircea ^b   Den Boef, Arie ^c   Van Der Schaar, Maurits ^c   Hunter, Adolph ^c  

^a NANOMETRICS INC   (United States)

^b ASML US Inc   (United States)

^c ASML   (Netherlands)

Author keywords

Diffraction; Diffraction efficiency; OCD; Optical metrology; Overlay metrology; Process control; Scatterometry; Spectrum

Indexed keywords

DIFFRACTION GRATINGS; IMAGING SYSTEMS; MEASUREMENT ERRORS; NANOTECHNOLOGY; OPTICAL CORRELATION; OPTICAL PARAMETRIC OSCILLATORS; OPTICAL VARIABLES MEASUREMENT; SILICON WAFERS; STATISTICAL OPTICS;

BROADBAND DIFFRACTION; IMAGING OVERLAY MEASUREMENT; SCATTEROMETRY; STATISTICAL PARAMETERS;

SPECTRUM ANALYSIS;

EID: 0141500274     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483476     Document Type: Conference Paper

References (5)

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3. W. Yang, V. G. Zhuang, R. Lowe-Webb, Nanometrics, Inc.; D. Mui, W. Liou, H. Sasano, Applied Materials Line-profile and critical dimension measurements using a normal incidence optical metrology system
4. W. Yang, V. G. Zhuang, R. Lowe-Webb, Nanometrics, Inc.; D. Mui, W. Liu, H. Sasano, Applied Materials, Proc. SPIE, vol. 4689, pp. 966-976, 2002.
5. Normal incidence spectroscopic ellipsometry and polarized reflectometry for measurement and control of photoresist critical dimension. J. M. Holden, T. Gubiotti, W. A. McGahan, Nanometrics Inc.; T. Kiers, ASML (Netherlands), Proc. SPIE, vol. 4689, pp. 1110-1121, 2002.