Product-wafer focus-exposure monitor for advanced flash memory

Microlithography World

Volumn 13, Issue 1, 2004, Pages 5-9

  Hannon, Sean ^a   Kennemer, Harold ^a   Monahan, Kevin ^b   Eichelberger, Brad ^b  

^a FASL LLC F25   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL-DIMENSION ERROR (CDE); DATA VALIDATION; EDGE-PLACEMENT ERROR (EPE);

ALGORITHMS; CALIBRATION; COST EFFECTIVENESS; DATA REDUCTION; ERROR ANALYSIS; EXPOSURE CONTROLS; LITHOGRAPHY; MEASUREMENT ERRORS; PROCESS CONTROL; PRODUCTIVITY; SENSITIVITY ANALYSIS; STATISTICAL METHODS; THERMAL EFFECTS; WSI CIRCUITS;

FLASH MEMORY;

EID: 1642323573     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (7)

1. K. Monahan, "Microeconomics of Process Control in Semiconductor Manufacturing," Proc. of SPIE, Vol. 5043, pp. 57-71, February 2003.
2. K. Monahan, P. Lord, "Lithographic Focus Stabilization for Model-Based Gate CD Control Systems," Proc. of ISSM, presented at ISSM, October 1998.
3. A. Starikov, "Exposure Monitor Structure," Proc. of SPIE, Vol. 1261, pp. 315-325, February 1990.
4. C.P. Ausschnitt, C.J. Progler, W. Chu, "CD Control of Low-k Factor Step-and-Scan Lithography," Proc. of SPIE, Vol. 4346, pp. 293-302, February 2001.
5. M. Asano, F. Tadahito, K. Izuha, S. Inoue, "Run-to-Run CD Error Analysis and Control with Monitoring of Effective Dose and Focus," Proc. of SPIE, Vol. 5038, pp. 239-246, February 2003.
6. K. Izuha, M. Asano, T. Fujisawa, S. Inoue, "Novel In situ Focus Monitor Technology in Attenuated PSM under Actual Illumination Condition," Proc. of SPIE, Vol. 5040, pp. 590-599, February 2003.
7. B. Eichelberger, B. Dinu, H. Pedut, "Simultaneous Dose and Focus Monitoring on Product Wafers," Proc. of SPIE, Vol. 5038, pp. 247-254, February 2003.