Scatterometry-based overlay metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 126-137

  Huang, Hsu Ting ^a   Raghavendra, Gayathri ^a   Sezginer, Apo ^a   Johnson, Kenneth ^a   Stanke, Fred ^a   Zimmerman, Michelle ^a   Cheung, Cristina ^b   Miyagi, Makoto ^c   Singh, Bhanwar ^b  

^a Therma Wave Inc   (United States)

^b ADVANCED MICRO DEVICES   (United States)

^c TOKYO ELECTRON AMERICA INC   (United States)

Author keywords

Alignment; Grating; Overlay; Scatterometry

Indexed keywords

CALCULATIONS; DIFFRACTION GRATINGS; MATHEMATICAL MODELS; OPTICAL INSTRUMENTS; OPTICAL PROPERTIES; REFLECTOMETERS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS;

NORMAL INCIDENCE SPECTROSCOPIC REFLECTOMETER; OVERLAY METROLOGY; REPEATABILITY; REPRODUCIBILITY; RIGOROUS COUPLED WAVE ANALYSIS; SCATTEROMETRY;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141723696     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483668     Document Type: Conference Paper

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