CD control of low k-factor step-and-scan lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 293-302

  Ausschnitt, Christopher P ^a   Progler, Christopher J ^a   Chu, William ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA REDUCTION; FEEDBACK CONTROL; FOCUSING; MASKS; PROCESS CONTROL;

CONTRAST VARIATIONS;

LITHOGRAPHY;

EID: 0035759391     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435729     Document Type: Conference Paper

References (3)

1. C.P. Ausschnitt, "Distinguishing dose and defocus for in-line lithography control," Proc. SPIE 3677, 140-147 (1999).
2. C.P. Ausschnitt, W. Chu, L. Hadel, H. Ho, P. Talvi, "Process Window Metrology," Proc. SPIE 3998, 158-166 (2000).
3. Proc. SPIE 1.