Novel in-situ focus monitor technology in attenuated PSM under actual illumination condition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 590-599

  Izuha, Kyoko ^a   Asano, Masafumi ^a   Fujisawa, Tadahito ^a   Inoue, Soichi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Effective; Focus; In situ; Monitor; Phase shift

Indexed keywords

COHERENT LIGHT; DIFFRACTION; ERRORS; FOCUSING; MASKS; OPTICAL SYSTEMS; OPTIMIZATION;

CRITICAL DIMENSION CONTROL; EFFECTIVE FOCUS MONITOR; FOCUS CONTROL; PHASE SHIFT MASK;

PHOTOLITHOGRAPHY;

EID: 0141722343     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485364     Document Type: Conference Paper

References (3)

1. T.A. Brunner et al., "Quantitative stepper metrology using the focus monitor test mask", Proc. SPIE Vol.2197 p. 541 (1994).
2. H. Nomura et al., "Accurate measurement of spherical and astigmatic aberrations by a phase shift grating reticle", Jpn. J. Appl. Phys. Vol. 40 (2001) pp.6316-6322.
3. C. P. Ausschnitt, C. J. Progler, and W. Chu, "CD control of low k-factor step-and-scan lithography," Proc. SPIE Vol. 4346 pp. 293-302 (2001).