Distinguishing dose from defocus for in-line lithography control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 140-147

  Ausschnitt, Christopher P ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MASKS; PROCESS CONTROL; SPATIAL VARIABLES MEASUREMENT;

CRITICAL DIMENSION (CD) METROLOGY; IN-LINE LITHOGRAPHY CONTROL; IN-LINE METROLOGY;

PHOTOLITHOGRAPHY;

EID: 0032662506     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350800     Document Type: Conference Paper

References (9)