Light diffraction based overlay measurement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue 1, 2001, Pages 222-233

  Bischoff, J ^a   Brunner, R ^a   Bauer, J ^b   Haak, U ^b  

^a CARL ZEISS SMT AG   (Germany)

^b IHP Frankfurt O   (Germany)

Author keywords

Diffraction; Diffraction grating; Overlay measurement; Stepper qualification

Indexed keywords

DIFFRACTION GRATINGS; ELECTROMAGNETIC WAVE DIFFRACTION; IMAGE PROCESSING; LASER BEAMS; OPTICAL RESOLVING POWER; SIGNAL TO NOISE RATIO;

DIFFRACTION MODELING;

IMAGING TECHNIQUES;

EID: 0034756471     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436745     Document Type: Article

References (12)

1. Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard
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3. Effects of illumination wavelength on the accuracy of optical overlay metrology
4. Novel design of WIS-free overlay measurement mark
5. Scatterometry applied to microelectronic processing
6. Optical scatterometry of quarter micron patterns using neural regression
7. Scatterometry measurement of sub-0.1 μm linewidth gratings
8. Specular spectroscopic scatterometry in DUV lithography
9. Beiträge zur theoretischen und experimentellen untersuchung der lichtbeugung an mikrostrukturierten mehrschichtsystemen
10. Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: Enhanced transmittance matrix approach
11. Multilayer modal method for diffraction gratings of arbitrary profile, depth, and permittivity