An exponential decay function as a model of the oxygen concentration profile in the surface of a polystyrene sample exposed to an oxygen plasma

Journal of Electron Spectroscopy and Related Phenomena

Volumn 135, Issue 2-3, 2004, Pages 183-190

  Paynter, R W ^a  

^a INRS EMT   (Canada)

Author keywords

ARXPS; Average practical EAL; Depth profile; IMFP; Oxygen plasma; Polystyrene

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; COMPUTATIONAL METHODS; ELECTRON SCATTERING; HELIUM; LAPLACE TRANSFORMS; OXIDATION; PLASMAS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

ARXPS; AVERAGE PRACTICAL EAI; DEPTH PROFILE; IMFP; OXYGEN PLASMAS;

POLYSTYRENES;

EID: 2942620495     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2003.07.001     Document Type: Article

References (35)

1. Chan C.-M., Ko T.-M., Hiraoka H. Surf. Sci. Rep. 24:1996;1.
2. Yasuda H.K. J. Appl. Polym. Sci. Polym. Symp. 42:1988;46.
3. R. d'Agostino, Plasma Deposition, Treatment and Etching of Polymers, Academic Press, New York, 1990.
4. Morra M., Occhiello E., Marola R., Garbassi F., Humphrey P., Johnson D. J. Colloid Interface Sci. 137:1990;11.
5. F. Arefi-Khonsari, M. Tatoulian, N. Shahizadeh, J. Amouroux, in: R. d'Agostino, et al. (Eds.), Plasma Processing of Polymers, Kluwer Academic Publishers, The Netherlands, 1997, pp. 165-207.
6. Paynter R.W. Surf. Interface Anal. 29:2000;56.
7. France R.M., Short R.D. Langmuir. 14:1998;4827.
8. Gerenser L.J. J. Adhesion Sci. 7:1993;1019.
9. M.R. Wertheimer, R. Bartnikas, in: R. d'Agostino, et al. (Eds.), Plasma Processing of Polymers, Kluwer Academic Publishers, The Netherlands, 1997, pp. 435-450.
10. Dupont-Gillain Ch.C., Adriaensen Y., Derclaye S., Rouxhet P.G. Langmuir. 16:2000;8194.
11. Paynter R.W. Surf. Interface Anal. 26:1998;674.
12. Ton-That C., Campbell P.A., Bradley R.H. Langmuir. 16:2000;5054.
13. Powell C.J., Jablonski A. Surf. Interface Anal. 29:2000;108.
14. Paynter R.W. Surf. Interface Anal. 33:2002;14.
15. Paynter R.W. Surf. Interface Anal. 33:2002;862.
16. Bain C.D., Whitesides G.M. J. Am. Chem. Soc. 110:1998;5897.
17. Cumpson P.J. J. Electron. Spectrosc. Relat. Phenom. 73:1995;25.
18. Ro C.-U. Surf. Interface Anal. 25:1997;869.
19. Dwyer V.M. Surf. Interface Anal. 20:1993;687.
20. Paynter R.W. Surf. Interface Anal. 3:1981;186.
21. Benmassaoud A.A., Paynter R.W. Thin Solid Films. 287:1996;125.
22. Scofield J.H. J. Electron. Spectrosc. Relat. Phenom. 8:1976;129.
23. Tremblay M.-C., Paynter R.W. Surf. Interface Anal. 35:2003;502.
24. Powell C.J., Jablonski A. Surf. Interface Anal. 33:2002;211.
25. Baschenko O.A., Nesmeev A.E. J. Electron. Spectrosc. Relat. Phenom. 57:1991;33.
26. Cumpson P.J., Seah M.P. Surf. Interface Anal. 25:1997;430.
27. C.J. Powell, A. Jablonski, NIST Electron Effective-Attenuation-Length Database, SRD US Department of Commerce, National Institute of Standards and Technology, Gaithersburg, MD, 2001.
28. Gries W.H. Surf. Interface Anal. 24:1996;38.
29. Suzuki N., Iimura K., Satoh S., Saito Y., Kato T., Tanaka A. Surf. Interface Anal. 25:1997;650.
30. Suzuki N., Kato T., Tougaard S. Surf. Interface Anal. 31:2001;862.
31. Beamson G., Briggs D. Surf. Interface Anal. 26:1998;343.
32. Buchwalter L.P., Czornyi G. J. Vac. Sci. Technol. A. 8:1990;781.
33. Takahagi T., Nakayama Y., Soeda F., Ishitani A. J. Appl. Polym. Sci. 41:1990;1451.
34. Frydman E., Cohen H., Maoz R., Sagiv J. Langmuir. 13:1997;5089.
35. C.J. Powell, A. Jablonski, NIST Electron Inelastic-Mean-Free-Path Database, SRD 71, US Department of Commerce, National Institute of Standards and Technology, Gaithersburg, MD, 2000.