Model for analysis of XPS electron take-off angle experiments in layer-structured samples: Determination of attenuation lengths in a well-characterized Langmuir-Blodgett film

Surface and Interface Analysis

Volumn 25, Issue 9, 1997, Pages 650-659

  Suzuki, Noboru ^a   Iimura, Ken Ichi ^a   Satoh, Shin ^a   Saito, Yoshinari ^a   Kato, Teiji ^a   Tanaka, Akihiro ^b  

^a UTSUNOMIYA UNIVERSITY   (Japan)

^b ULVAC PHI Inc   (Japan)

Author keywords

AFM; Attenuation length; Electron take off angle; Langmuir Blodgett film; Layered structure; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CALCULATIONS; LEAST SQUARES APPROXIMATIONS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ATTENUATION LENGTH; ELECTRON TAKE OFF ANGLE; LAYERED STRUCTURE;

LANGMUIR BLODGETT FILMS;

EID: 0031212152     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199708)25:9<650::AID-SIA278>3.0.CO;2-B     Document Type: Article

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