Influence of the power and pressure on the growth rate and refractive index of a-C:H thin films deposited by r.f. Plasma-enhanced chemical vapour deposition

Thin Solid Films

Volumn 287, Issue 1-2, 1996, Pages 125-129

  Benmassaoud, A A ^a   Paynter, R W ^b  

^a MOHAMMED V UNIVERSITY IN RABAT   (Morocco)

^b INRS EMT   (Canada)

Author keywords

Amorphous materials; Carbon; Optical properties; Plasma processing and deposition

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; ELLIPSOMETRY; FILM GROWTH; OPTICAL PROPERTIES; PLASMA APPLICATIONS; PRESSURE EFFECTS; SURFACE STRUCTURE; THERMAL CONDUCTIVITY OF SOLIDS; THERMODYNAMIC STABILITY; THIN FILMS;

HYDROGENATED AMORPHOUS CARBON; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

AMORPHOUS FILMS;

EID: 0030259425     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08777-9     Document Type: Article

References (19)

1. S. Aisenberg and R. Chabot, J. Appl. Phys., 42 (1971) 2953.
2. J. Winter, H.G. Esser, F. Waelbroeck and P. Wienhold, Proc. E-MRS-Symp. a-C:H Films, 1987.
3. L. Holland and S.M. Ojha, Thin Solid Films, 38 (1976) L17.
4. L. Holland and S.M. Ojha, Thin Solid Films, 58 (1979) 107.
5. D.S. Whistmell and R. Williamson, Thin Solid Films, 35 (1976) 255.
6. K.H. Besocke, G. Flentje, U. Littmak, P. Wienhold, H.G. Esser and J. Winter, J. Nucl. Mater., 145-147 (1987) 654.
7. T.J. Moravec and T.W. Orent, J. Vac. Sci. Technol., 18 (1981) 226.
8. T. Mon and Y. Namba, J. Vac, Sci. Technol A, 1 (1) (1983) 23.
9. B.V. Spitsyn, L.L. Bsnilov and B.V. Derjaguin, J. Cryst. Growth, 52 (1981) 219.
10. A.B. Bruce and S.K. Rutledge, J. Vac. Sci. Technol., 21 (3) (1982) 807.
11. J.J. Hauser, J. Non-Cryst. Solids, 23 (1977) 21.
12. S. Berg and L.P. Anderson, Thin Solid Films, 58 (1979) 117.
13. H. Vora and T.J. Moravec, J. Appl. Phys., 52 (1981) 6151.
14. H. Kersten and M.W. Kroesen, J. Vac. Sci. Technol. A, 8 (1) (1990) 38.
15. H. Deutsch, H. Kersten, S. Klagge and Rutscher, Contrib. Plasma Phys., 28 (1988) 49.
16. S. Yatsuya, S. Kasukabe and R. Uyeda, Jpn. J. Appl. Phys., 13 (1971) 1714.
17. Y. Catherine and P. Couderc, Thin Solid Films, 146 (1987) 93.
18. G.G. Ross, B. Terreault, G. Gobeil, G. Abel, C. Boucher and G. Veilleux, J. Nucl. Mater., 128/129 (1984) 730.
19. G.G. Ross and I. Richard, Nucl. Instrum. Methods Nucl. Mater. B, 64 (1992) 603.