Structure and secondary electron emission properties of MgO films deposited by pulsed mid-frequency magnetron sputtering

Journal of Applied Physics

Volumn 93, Issue 3, 2003, Pages 1422-1427

  Cheng, Y H ^a,b   Kupfer, H ^a   Richter, F ^a   Giegengack, H ^a   Hoyer, W ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; GRAIN SIZE AND SHAPE; MAGNESIA; MAGNETRON SPUTTERING; OXYGEN; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY EMISSION; SURFACES; X RAY DIFFRACTION;

SECONDARY ELECTRON EMISSION;

OPTICAL FILMS;

EID: 0037321679     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1534375     Document Type: Article

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