Influence of O2 flow rate on the structural properties of MgO films deposited by dual magnetron sputtering

Surface and Coatings Technology

Volumn 177-178, Issue , 2004, Pages 784-788

  Cheng, Y H ^a   Kupfer, H ^a   Krause, U ^b   Kopte, T ^b   Peters, C ^b   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b InstfurElektronenstrahl/Plasmatech   (Germany)

Author keywords

Dual magnetron sputtering; MgO films; O2 flow rate; Secondary electron emission coefficient

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL DEFECTS; CRYSTAL ORIENTATION; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SURFACE DISCHARGES; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

FLOW RATES;

MAGNESIA;

COATING;

EID: 1342310553     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.06.007     Document Type: Article

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