Synthesis of high-density MgO films by a novel magnetron sputtering system

Vacuum

Volumn 75, Issue 1, 2004, Pages 1-6

  Nam, Kyung H ^a,b   Jung, Min J ^a   Han, Jeon G ^a   Kopte, Torsten ^b   Hartung, Ullrich ^b   Peters, Carsten ^b  

^a Sungkyunkwan University   (South Korea)

^b Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Grids; High density; Magnetron sputtering; MgO films; Microstructure

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; KINETIC ENERGY; MAGNESIUM COMPOUNDS; MICROSTRUCTURE; PLASMA DENSITY; PLASMAS; POLYCRYSTALLINE MATERIALS; TRANSMISSION ELECTRON MICROSCOPY;

AC-PLASMA DISPLAY PANELS (AC-PDP); GRIDS; HIGH DENSITY; MAGNETRON DISCHARGE VOLTAGE;

MAGNETRON SPUTTERING;

EID: 2642583459     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.12.125     Document Type: Article

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