Deposition of MgO films by pulsed mid-frequency magnetron sputtering

Applied Surface Science

Volumn 200, Issue 1-4, 2002, Pages 117-124

  Cheng, Y H ^a   Kupfer, H ^a   Richter, F ^a   Paraian, Andreea Maria ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

MgO films; Pulsed mid frequency magnetron sputtering; Secondary electron emission coefficient

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; EVAPORATION; FILM GROWTH; HYSTERESIS; MAGNESIA; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXYGEN; REFRACTIVE INDEX; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THIN FILMS; TRANSPARENCY; X RAY DIFFRACTION;

PULSED MID-FREQUENCY MAGNETRON SPUTTERING;

SURFACE PROPERTIES;

EID: 0037110987     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00618-9     Document Type: Article

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