Effect of inductively-coupled plasma assist on the crystal orientation of magnesium oxide thin films produced by reactive sputtering

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 64-68

  Matsuda, Y ^a   Iwaya, M ^a   Koyama, Y ^a   Shinohara, M ^a   Fujiyama, H ^a  

^a NAGASAKI UNIVERSITY   (Japan)

Author keywords

Oxides; Plasma processing and deposition; Sputtering; X Ray diffraction

Indexed keywords

CAPACITORS; CRYSTAL GROWTH; CRYSTAL ORIENTATION; ELECTRON ABSORPTION; INDUCTIVELY COUPLED PLASMA; MAGNESIA; MAGNETRON SPUTTERING; MAGNETRONS; PERTURBATION TECHNIQUES; SPUTTER DEPOSITION; X RAY DIFFRACTION;

ELECTRON BEAM EVAPORATION; PLASMA DISPLAY PANELS; PLASMA PROCESSING AND DEPOSITION; REACTIVE SPUTTERING;

THIN FILMS;

EID: 2342632531     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.015     Document Type: Conference Paper

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