Process diagnostics during the deposition of cubic boron nitride

Surface and Coatings Technology

Volumn 90, Issue 3, 1997, Pages 275-284

  Pintaske, R ^a   Welzel, Th ^a   Kahl, N ^a   Schaller, M ^a   Hahn, J ^a   Richter, F ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Cubic boron nitride; Magnetron deposition; Process diagnostics

Indexed keywords

ELECTRODES; EMISSION SPECTROSCOPY; ESTIMATION; IONIC CONDUCTION IN SOLIDS; MAGNETRON SPUTTERING; OPTICAL MICROSCOPY; PLASMA DIAGNOSTICS; PLASMA PROBES; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS;

BOHM'S SHEATH CRITERIA; CUBIC BORON NITRIDE THIN FILMS; LANGMUIR DOUBLE PROBE METHOD;

CUBIC BORON NITRIDE;

EID: 0031123925     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03149-0     Document Type: Article

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