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Volumn 24, Issue 18, 2005, Pages 3066-3073

Synthesis and characterisation of Hf(thd)2X2 derivatives [X = N(SiMe3)2, OSiMe3 and OSi tBuMe2] as precursors for MOCVD of hafnium silicate films

(5) Hubert Pfalzgraf, Liliane G a Touati, Nadia a Pasko, Sergej V a,b Vaissermann, J c Abrutis, Adulfas b

a INST DE RECHERCHES SUR LA CATALYSE (France)

b VILNIUS UNIVERSITY (Lithuania)

c SORBONNE UNIVERSITÉ (France)

Author keywords

Diketonate; Hafnium; MOCVD; Silicate; Silylamide; Silyloxide; Structure

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS SILICON; HAFNIUM COMPOUNDS; SAPPHIRE; SINGLE CRYSTALS; VOLATILE ORGANIC COMPOUNDS; X RAY DIFFRACTION;

DIKETONATE; HAFNIUM SILICATE FILMS; SILOXIDES; SILYLAMIDES; SILYLOXIDE; SYNTHESIS AND CHARACTERIZATIONS; SYNTHESISED; TETRAMETHYL; TRANS- EFFECTS; X- RAY DIFFRACTIONS;

SILICATES;

EID: 28444484927 PISSN: 02775387 EISSN: None Source Type: Journal
DOI: 10.1016/j.poly.2005.06.036 Document Type: Article

Times cited : (19)

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