Two-dimensional void growth during thermal decomposition of thin HfO2 films on Si

Physical Review B - Condensed Matter and Materials Physics

Volumn 71, Issue 23, 2005, Pages

  Miyata, Noriyuki ^a   Morita, Yukinori ^a   Horikawa, Tsuyoshi ^a   Nabatame, Toshihide ^a   Ichikawa, Masakazu ^a,b   Toriumi, Akira ^a,b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 28344456383     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.71.233302     Document Type: Article

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