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Volumn 158, Issue 11-12, 2003, Pages 771-781

Behavior of implanted hydrogen in thermally stimulated blistering in silicon

Author keywords

Blistering; Hydrogen; Implantation; Interference spectroscopy; Ion cut; Silicon

Indexed keywords

AGGLOMERATION; DEFORMATION; ELASTICITY; HEAT TREATMENT;

EID: 28344452983     PISSN: 10420150     EISSN: 10294953     Source Type: Journal    
DOI: 10.1080/1042015021000043854     Document Type: Article
Times cited : (2)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.