Material properties and growth control of undoped and Sn-doped In 2O3 thin films prepared by using ion beam technologies

Thin Solid Films

Volumn 496, Issue 1, 2006, Pages 81-88

  Koh, Seok Keun ^a   Han, Young Gun ^a   Lee, Jung Hwan ^a   Yeo, Un Jung ^a   Cho, Jun Sik ^a  

^a P and I Corporation Ltd   (South Korea)

Author keywords

Ion beam sputter deposition; Ion assisted deposition; Ion assisted reaction; Sn doped In2O3; Undoped In2O3

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); GLASS; INDIUM COMPOUNDS; ION BEAMS; LIGHT EMITTING DIODES; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS;

ION BEAM SPUTTER DEPOSITION; ION-ASSISTED DEPOSITION; ION-ASSISTED REACTION; SN-DOPED IN2O3; UNDOPED IN2O3;

TIN;

EID: 28044466947     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.251     Document Type: Conference Paper

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