Multilayer barrier coating system produced by plasma-impulse chemical vapor deposition (PICVD)

Surface and Coatings Technology

Volumn 80, Issue 1-2, 1996, Pages 200-202

  Walther, M ^a   Heming, M ^a   Spallek, M ^a  

^a SCHOTT AG   (Germany)

Author keywords

Coating; Diffusion barrier; Multilayer; Plasma impulse chemical vapor deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; GEOMETRY; MECHANICAL PERMEABILITY; MECHANICAL VARIABLES MEASUREMENT; MICROWAVES; MULTILAYERS; OXYGEN; PLASMA APPLICATIONS; POLYETHYLENE TEREPHTHALATES; WATER;

DIFFUSION BARRIER; MULTILAYER BARRIER COATING; PLASMA IMPULSE CHEMICAL VAPOR DEPOSITION; PULSED MICROWAVE PLASMA; THREE DIMENSIONAL SUBSTRATE GEOMETRIES;

DIFFUSION COATINGS;

EID: 0030107324     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(95)02711-4     Document Type: Article

References (7)

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