SCOPUS 정보 검색 플랫폼

Volumn 473, Issue 2, 2005, Pages 218-223

Ultraflat indium tin oxide films prepared by ion beam sputtering

Author keywords

Ambient oxygen; Indium tin oxide; Ion beam sputtering

Indexed keywords

ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; FILM GROWTH; ION BEAMS; MICROSTRUCTURE; MORPHOLOGY; SURFACE ROUGHNESS; THICK FILMS; TIN COMPOUNDS;

AMBIENT OXYGEN; GLASS SUBSTRATES; INDIUM TIN OXIDE (ITO); ION BEAM SPUTTERING;

INDIUM COMPOUNDS;

EID: 10644292482 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.05.125 Document Type: Article

Times cited : (27)

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