-
1
-
-
0036575795
-
T in a manufacturable technology
-
May
-
T in a manufacturable technology," IEEE Electron Device Lett., vol. 23. no. 5, pp. 258-260, May 2002.
-
(2002)
IEEE Electron Device Lett.
, vol.23
, Issue.5
, pp. 258-260
-
-
Jagannathan, B.1
Khater, M.2
Pagette, F.3
Rieh, J.-S.4
Angell, D.5
Chen, H.6
Florkey, J.7
Golan, F.8
Greenberg, D.R.9
Groves, R.10
Jeng, S.J.11
Johnson, J.12
Mengistu, E.13
Schonenberg, K.T.14
Schnabel, C.M.15
Smith, P.16
Stricker, A.17
Ahlgren, D.18
Freeman, G.19
Stein, K.20
Subbanna, S.21
more..
-
2
-
-
0842331408
-
Direction to improve SiGe BiCMOS technology featuring 200-GHz SiGe HBT and 80-nm gate CMOS
-
T. Hashimoto, Y. Nonaka. T. Tominari, H. Fujiwara. K. Tokunaga, M. Arai, S. Wada, T. Udo, M. Seto, M. Miura, H. Shimamoto. K. Washio, and H. Tomioka, "Direction to improve SiGe BiCMOS technology featuring 200-GHz SiGe HBT and 80-nm gate CMOS." in IEDM Tech. Dig., 2003, pp. 129-132.
-
(2003)
IEDM Tech. Dig.
, pp. 129-132
-
-
Hashimoto, T.1
Nonaka, Y.2
Tominari, T.3
Fujiwara, H.4
Tokunaga, K.5
Arai, M.6
Wada, S.7
Udo, T.8
Seto, M.9
Miura, M.10
Shimamoto, H.11
Washio, K.12
Tomioka, H.13
-
3
-
-
1042289143
-
SiGe bipolar technology with 3.9 ps gate delay
-
T. F. Meister, H. Schäfer, K. Aufinger, R. Stengl, S. Boguth. R. Schreiter, M. Rest, H. Knapp. M. Wurzer, A. Mitchell, T. Böttner, and J. Bock, "SiGe bipolar technology with 3.9 ps gate delay," in Proc. BCTM, 2003, pp. 103-106.
-
(2003)
Proc. BCTM
, pp. 103-106
-
-
Meister, T.F.1
Schäfer, H.2
Aufinger, K.3
Stengl, R.4
Boguth, S.5
Schreiter, R.6
Rest, M.7
Knapp, H.8
Wurzer, M.9
Mitchell, A.10
Böttner, T.11
Bock, J.12
-
4
-
-
17044414543
-
SiGe technology requirements for millimeter-wave applications
-
P. Wennekers and R. Reuter, "SiGe technology requirements for millimeter-wave applications," in Proc. BCTM, 2004, pp. 79-83.
-
(2004)
Proc. BCTM
, pp. 79-83
-
-
Wennekers, P.1
Reuter, R.2
-
5
-
-
20144388719
-
230 GHz self-aligned SiGeC HBT for 90-nm BiCMOS technology
-
P. Chevalier, C. Fellous, L. Rubaldo, D. Dutartre, M. Laurens. T. Jagueneau, F. Leverd, S. Bord, C. Richard. D. Lenoble, J. Bonnouvrier. M. Marty, A. Perrotin, D. Gloria, F. Saguin, B. Barbalat. R. Beerkens. N. Zerounian, F. Aniel, and A. Chantre. "230 GHz self-aligned SiGeC HBT for 90-nm BiCMOS technology," in Proc. BCTM, 2004, pp. 225-228.
-
(2004)
Proc. BCTM
, pp. 225-228
-
-
Chevalier, P.1
Fellous, C.2
Rubaldo, L.3
Dutartre, D.4
Laurens, M.5
Jagueneau, T.6
Leverd, F.7
Bord, S.8
Richard, C.9
Lenoble, D.10
Bonnouvrier, J.11
Marty, M.12
Perrotin, A.13
Gloria, D.14
Saguin, F.15
Barbalat, B.16
Beerkens, R.17
Zerounian, N.18
Aniel, F.19
Chantre, A.20
more..
-
6
-
-
0033280585
-
A high performance 0.35 μm SiGe BiCMOS technology for wireless applications
-
A. Monroy, M. Laurens, M. Marty, D. Dutartre. D. Gloria, J. L. Carbonero, A. Perrotin, M. Roche, and A. Chantre. "A high performance 0.35 μm SiGe BiCMOS technology for wireless applications," in Proc. BCTM, 1999, pp. 121-124.
-
(1999)
Proc. BCTM
, pp. 121-124
-
-
Monroy, A.1
Laurens, M.2
Marty, M.3
Dutartre, D.4
Gloria, D.5
Carbonero, J.L.6
Perrotin, A.7
Roche, M.8
Chantre, A.9
-
7
-
-
0035164139
-
High performance 0.25 μm SiGe and SiGe:C HBT's using non selective epitaxy
-
H. Baudry, B. Martinet, C, Fellous, O. Kermarrec. Y. Campidelli. M. Laurens, M. Marty, J. Mourier, G. Troillard. A. Monroy, D. Dutartre, D. Bensahel, G. Vincent, and A. Chantre, "High performance 0.25 μm SiGe and SiGe:C HBT's using non selective epitaxy." in Proc. BCTM. 2001, pp. 52-55.
-
(2001)
Proc. BCTM.
, pp. 52-55
-
-
Baudry, H.1
Martinet, B.2
Fellous, C.3
Kermarrec, O.4
Campidelli, Y.5
Laurens, M.6
Marty, M.7
Mourier, J.8
Troillard, G.9
Monroy, A.10
Dutartre, D.11
Bensahel, D.12
Vincent, G.13
Chantre, A.14
-
8
-
-
1042277548
-
max 0.13-μm SiGe:C BiCMOS technology
-
max 0.13-μm SiGe:C BiCMOS technology." in Proc. BCTM, 2003, pp. 199-202.
-
(2003)
Proc. BCTM
, pp. 199-202
-
-
Laurens, M.1
Martinet, B.2
Kermarrec, O.3
Campidelli, Y.4
Deléglise, F.5
Dutartre, D.6
Troillard, G.7
Gloria, D.8
Bonnouvrier, J.9
Beerkens, R.10
Rousset, V.11
Leverd, F.12
Chantre, A.13
Monroy, A.14
-
9
-
-
20144387240
-
Lateral and vertical scaling of a QSA HBT for a 0.13-μm 200 GHz SiGe:C BiCMOS technology
-
S. Van Huylenbroeck, A. Subaja-Hernandez. A. Piontek, L. J. Choi, M. X. Xu, N. Ouassif, F. Vleugels, K. Van Wichelen, L. Witters, E. Kunnen, P. Leray, K. Devriendt, X. Shi, R. Loo, and S. Decoutere, "Lateral and vertical scaling of a QSA HBT for a 0.13-μm 200 GHz SiGe:C BiCMOS technology," in Proc. BCTM, 2004, pp. 229-232.
-
(2004)
Proc. BCTM
, pp. 229-232
-
-
Van Huylenbroeck, S.1
Subaja-Hernandez, A.2
Piontek, A.3
Choi, L.J.4
Xu, M.X.5
Ouassif, N.6
Vleugels, F.7
Van Wichelen, K.8
Witters, L.9
Kunnen, E.10
Leray, P.11
Devriendt, K.12
Shi, X.13
Loo, R.14
Decoutere, S.15
-
10
-
-
0033280016
-
Carbon doped SiGe heterojunction bipolar transistors for high frequency applications
-
H. J. Osten, D. Knoll, B. Heinemann, H. Rücker, and B. Tillack, "Carbon doped SiGe heterojunction bipolar transistors for high frequency applications," in Proc. BCTM, 1999, pp. 109-116.
-
(1999)
Proc. BCTM
, pp. 109-116
-
-
Osten, H.J.1
Knoll, D.2
Heinemann, B.3
Rücker, H.4
Tillack, B.5
-
11
-
-
0036927963
-
SiGe HBT's with cut-off frequency of 350 GHz
-
J.-S. Rieh, B. Jagannathan, H. Chen, K. T. Schonenberg, D. Angell, A. Chinthakindi, J. Florkey, F. Golan, D. Greenberg, S.-J. Jeng, M. Khater, F. Pagette, C. Schnabel, P. Smith, A. Stricker, K. Vaed, R. Volant, D. Ahlgren, G. Freeman, K. Stein, and S. Subbanna, "SiGe HBT's with cut-off frequency of 350 GHz," in IEDM Tech. Dig., 2002, pp. 771-774.
-
(2002)
IEDM Tech. Dig.
, pp. 771-774
-
-
Rieh, J.-S.1
Jagannathan, B.2
Chen, H.3
Schonenberg, K.T.4
Angell, D.5
Chinthakindi, A.6
Florkey, J.7
Golan, F.8
Greenberg, D.9
Jeng, S.-J.10
Khater, M.11
Pagette, F.12
Schnabel, C.13
Smith, P.14
Stricker, A.15
Vaed, K.16
Volant, R.17
Ahlgren, D.18
Freeman, G.19
Stein, K.20
Subbanna, S.21
more..
-
12
-
-
18144453144
-
Ultra high speed SiGe NPN for advanced BiCMOS technology
-
M. Racanelli, K. Schuegraf, A. Kalburge, A. Kar-Roy, B. Shen, C. Hu, D. Chapek, D. Howard, D. Quon, F. Wang, G. U'ren, L. Lao, H. Tu, J. Zheng, J. Zhang, K. Bell, K. Yin, P. Joshi, S. Akhtar, S. Vo, T. Lee, W. Shi, and P. Kempf, "Ultra high speed SiGe NPN for advanced BiCMOS technology," in IEDM Tech. Dig., 2001, pp. 336-339.
-
(2001)
IEDM Tech. Dig.
, pp. 336-339
-
-
Racanelli, M.1
Schuegraf, K.2
Kalburge, A.3
Kar-Roy, A.4
Shen, B.5
Hu, C.6
Chapek, D.7
Howard, D.8
Quon, D.9
Wang, F.10
U'ren, G.11
Lao, L.12
Tu, H.13
Zheng, J.14
Zhang, J.15
Bell, K.16
Yin, K.17
Joshi, P.18
Akhtar, S.19
Vo, S.20
Lee, T.21
Shi, W.22
Kempf, P.23
more..
-
13
-
-
84888914677
-
-
" Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit," U.S. Patent 6,492,238, Dec. 10
-
D. Ahlgren et al., " Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit," U.S. Patent 6,492,238, Dec. 10, 2002.
-
(2002)
-
-
Ahlgren, D.1
-
14
-
-
84888898964
-
-
"Method for fabricating a self-aligned emitter in a bipolar transistor," Int. Patent Appl., Serial No. WO 02/43,132 A1, Nov. 19
-
M. Racanelli et al, "Method for fabricating a self-aligned emitter in a bipolar transistor," Int. Patent Appl., Serial No. WO 02/43,132 A1, Nov. 19, 2001.
-
(2001)
-
-
Racanelli, M.1
-
15
-
-
10644275584
-
Selective epitaxial growth of SiGe:C for high speed HBTs
-
H. Schäfer, J. Bock, R. Stengl, H. Knapp, K. Aufinger, M. Wurzer, S. Boguth, M. Rest, R. Schreiter, and T. F. Meister, "Selective epitaxial growth of SiGe:C for high speed HBTs," Appl Surf. Sci., vol. 224, pp. 18-23, 2004.
-
(2004)
Appl Surf. Sci.
, vol.224
, pp. 18-23
-
-
Schäfer, H.1
Bock, J.2
Stengl, R.3
Knapp, H.4
Aufinger, K.5
Wurzer, M.6
Boguth, S.7
Rest, M.8
Schreiter, R.9
Meister, T.F.10
-
16
-
-
0032626822
-
A high-speed low 1/f noise in SiGe HBT technology using epitaxially-aligned polysilicon emitters
-
Jul.
-
S. Jouan, R. Planche, H. Baudry, P. Ribot, J. A. Chroboczek, D. Dutartre, D. Gloria, M. Laurens, P. Llinares, M. Marty, A. Monroy, C. Morin, R. Pantel, A. Perrotin, J. de Pontcharra, J. L. Regolini, G. Vincent, and A. Chantre, "A high-speed low 1/f noise in SiGe HBT technology using epitaxially-aligned polysilicon emitters," IEEE Trans. Electron Devices, vol. 46, no. 7, pp. 1525-1530, Jul. 1999.
-
(1999)
IEEE Trans. Electron Devices
, vol.46
, Issue.7
, pp. 1525-1530
-
-
Jouan, S.1
Planche, R.2
Baudry, H.3
Ribot, P.4
Chroboczek, J.A.5
Dutartre, D.6
Gloria, D.7
Laurens, M.8
Llinares, P.9
Marty, M.10
Monroy, A.11
Morin, C.12
Pantel, R.13
Perrotin, A.14
De Pontcharra, J.15
Regolini, J.L.16
Vincent, G.17
Chantre, A.18
-
17
-
-
84907709288
-
max self-aligned SiGeC HBT using selective epitaxial growth of the base
-
max self-aligned SiGeC HBT using selective epitaxial growth of the base," in Proc. ESSDERC, 2003, pp. 299-302.
-
(2003)
Proc. ESSDERC
, pp. 299-302
-
-
Chevalier, P.1
Fellous, C.2
Martinet, B.3
Leverd, F.4
Saguin, F.5
Dutartre, D.6
Chantre, A.7
-
18
-
-
17044436668
-
max SiGeC HBT technology at room and cryogenic temperatures
-
max SiGeC HBT technology at room and cryogenic temperatures," in Proc. ISTDM, 2004, pp. 103-104.
-
(2004)
Proc. ISTDM
, pp. 103-104
-
-
Chevalier, P.1
Zerounian, N.2
Fellous, C.3
Rubaldo, L.4
Dutartre, D.5
Jagueneau, T.6
Leverd, F.7
Perrotin, A.8
Gloria, D.9
Barbalat, B.10
Aniel, F.11
Chantre, A.12
-
19
-
-
1042277555
-
Cryogenic performance of a 200 GHz SiGe HBT technology
-
B. Banerjee, S. Venkataraman, Y. Lu, S. Nuttinck, D. Heo, Y.-J. E. Chen, J. D. Cressler, J. Laskar, G. Freeman, and D. Ahlgren, "Cryogenic performance of a 200 GHz SiGe HBT technology," in Proc. BCTM, 2003, pp. 171-173.
-
(2003)
Proc. BCTM
, pp. 171-173
-
-
Banerjee, B.1
Venkataraman, S.2
Lu, Y.3
Nuttinck, S.4
Heo, D.5
Chen, Y.-J.E.6
Cressler, J.D.7
Laskar, J.8
Freeman, G.9
Ahlgren, D.10
-
20
-
-
3142708241
-
Transit times of SiGe:C HBT's using non selective base epitaxy
-
N. Zerounian, M. Rodriguez, M. Enciso, F. Aniel, P. Chevalier, B. Martinet, and A. Chantre, "Transit times of SiGe:C HBT's using non selective base epitaxy," Solid State Electron., vol. 48, pp. 2165-2174, 2004.
-
(2004)
Solid State Electron.
, vol.48
, pp. 2165-2174
-
-
Zerounian, N.1
Rodriguez, M.2
Enciso, M.3
Aniel, F.4
Chevalier, P.5
Martinet, B.6
Chantre, A.7
-
22
-
-
1642365005
-
26-42 GHz SOI CMOS low noise amplifier
-
Mar.
-
F. Ellinger, "26-42 GHz SOI CMOS low noise amplifier," IEEE J. Solid-State Circuits, vol. 39, no. 3, pp. 522-528, Mar. 2004.
-
(2004)
IEEE J. Solid-state Circuits
, vol.39
, Issue.3
, pp. 522-528
-
-
Ellinger, F.1
|