Development of a high velocity accessory for atomic force microscopy-based friction measurements

Review of Scientific Instruments

Volumn 76, Issue 8, 2005, Pages 1-7

  Tocha, Ewa ^a   Stefański, Tomasz ^b   Schönherr, Holger ^a   Julius Vancso, G ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b R and D Marine Technology Centre   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC HUMIDITY; ATOMIC FORCE MICROSCOPY; POLYMETHYL METHACRYLATES; TRIBOLOGY; VELOCITY MEASUREMENT;

ATOMIC FORCE MICROSCOPY-BASED FRICTION MEASUREMENTS; FRICTION FORCES; HIGH VELOCITY NANOTRIBOLOGY; SHEAR PIEZO ELEMENT;

FRICTION;

EID: 26444565341     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1994919     Document Type: Article

References (52)

1. S. J. Bull and A. M. Korsunsky, Tribol. Int. 31, 547 (1998).
2. S. C. Lee and A. A. Polycarpou, J. Tribol. 126, 334 (2004).
3. H. Zhang and K. Ono, Tribol. Int. 36, 361 (2003).
4. X. D. Li and B. Bhushan, J. Inf. Storage Process. Syst. 3, 131 (2001).
5. G. W. Tyndall, T. E. Karis, and M. S. Jhon, Tribol. Trans. 42, 463 (1999).
6. L. M. Phinney, G. Lin, J. Wellman, and A. Garcia, J. Micromech. Microeng. 14, 927 (2004).
7. R. Maboudian and C. Carraro, Annu. Rev. Phys. Chem. 55, 35 (2004).
8. M. P. de Boer, D. L. Luck, W. R. Ashurst, R. Maboudian, A. D. Corwin, J. A. Walraven, and J. M. Redmond, J. Microelectromech. Syst. 13, 63 (2004).
9. S. T. Patton and J. S. Zabinski, Tribol. Int. 35, 373 (2002).
10. W. Y. Wang, Y. L. Wang, H. F. Bao, B. Xiong, and M. H. Bao, Sens. Actuators, A 97, 486 (2002).
11. N. S. Tambe and B. Bhushan, Nanolechnology 15, 1561 (2004).
12. T. Cagin, J. W. Che, M. N. Gardos, A. Fijany, and W. A. Goddard, Nanotechnology 10, 278 (1999).
13. B. N. J. Persson, O. Albohr, F. Mancosu, V. Peveri, V. Samoilov, and I. M. Siveback, Wear 254, 835 (2003).
14. C. Drummond and J. Israelachvili, Phys. Rev. E 63, 041506 (2001).
15. L. I. Daikhin and M. Urbakh, Phys. Rev. E 59, 1921 (1999).
16. H. Yoshizawa, Y. L. Chen, and J. Israelachvili, J. Phys. Chem. 97, 4128 (1993).
17. N. Maeda, N. H. Chen, M. Tirrell, and J. N. Israelachvili, Science 297. 379 (2002).
18. S. Yamada and J. Israelachvili, J. Phys. Chem. B 102, 234 (1998).
19. J. P. Gao, W. D. Luedtke, D. Gourdon, M. Ruths, J. N. Israelachvili, and U. Landman, J. Phys. Chem. B 108, 3410 (2004).
20. O. Zwörner, H. Holscher, U. D. Schwarz, and R. Wiesendanger, Appl. Phys. A: Mater. Sci. Process. 66, S263 (1998).
21. E. Riedo, I. Pallaci, C. Boragno, and H. Brune, J. Phys. Chem. B 108, 5324 (2004).
22. E. Riedo, E. Gnecco, R. Bennewitz, E. Meyer, and H. Brune, Phys. Rev. Lett. 91, 084502 (2003).
23. E. Riedo, F. Levy, and H. Brune, Phys. Rev. Lett. 88, 185505 (2002).
24. E. Gnecco, R. Bennewitz, T. Gyalog, C. Loppacher, M. Bammerlin, E. Meyer, and H. J. Guntherodt, Phys. Rev. Lett. 84, 1172 (2000).
25. G. Luengo, M. Heuberger, and J. Israelachvili, J. Phys. Chem. B 104, 7944 (2000).
26. R. W. Carpick and M. Salmeron, Chem. Rev. (Washington, D.C.) 97, 1163 (1997).
27. J. F. Lübben and D. Johannsmann, Langmuir 20, 3698 (2004).
28. J. M. Kim, S. M. Chang, and H. Muramatsu, Appl. Phys. Lett. 74, 466 (1999).
29. Tip wear and environmental control over a broad range have also not been addressed.
30. Modified version with limited maximum voltage up to ±250 V, 50 W.
31. In principle, for open-loop systems (as described in this article), one can operate the piezo even above its resonance frequency. However, at resonance the amplitudes can become extremely large even for low input signals, which would cause piezo to break. Additionally, at high frequencies, a phase shift between the input signal and the motion of the piezo will occur. This phase shift is negligible at relative low frequencies. In the case of closed-loop operation, the piezos are typically used below 50% of their resonance frequency due to bandwidth limitations of the electronics.
32. The nominal shear piezo displacement is 5000 nm.
33. For higher scanning frequencies, due to cutoff of higher-frequency components in the spectrum, the wave form will become distorted. Consequently, from measured frictional signals, the acceleration and deceleration parts were excluded for further analysis, providing satisfactory approximation of linear velocity.
34. K. M. Vaeth, R. J. Jackman, A. J. Black, G. M. Whitesides, and K. F. Jensen, Langmuir 16, 8495 (2000).
35. J. P. Pickering and G. J. Vancso, Appl. Surf. Sci. 148, 147 (1999).
36. R. J. Young and P. A. Lovell, Introduction to Polymers (Chapman and Hall, London, 1991).
37. D. F. Moore, The Friction and Lubrication of Elastomers (Pergamon, Oxford, 1972).
38. M. Tortonese and M. Kirk, Proc. SPIE 3009, 53 (1997).
39. The friction force data are presented in arbitrary units, relative to the reference sample, due to large errors and different results between currently available lateral calibration methods.
40. J. E. Sader, Rev. Sci. Instrum. 74, 2438 (2003).
41. U. D. Schwarz, P. Köster, and R. Wiesendanger, Rev. Sci. Instrum. 67, 2560 (1996).
42. D. F. Ogletree, R. W. Carpick, and M. Salmeron, Rev. Sci. Instrum. 67, 3298 (1996).
43. E. Liu, B. Blanpain, and J. P. Celis, Wear 192, 141 (1996).
44. J. M. Neumeister and W. A. Ducker, Rev. Sci. Instrum. 65, 2527 (1994).
45. U. W. Gedde, Polymer Physics (Kluwer Academic, Dordrecht, 1999).
46. T. A. Hammerschmidt, W. L. Gladfelter, and G. Haugstad, Macromolecules 32, 3360 (1999).
47. B. W. Cherry, Polymer Surfaces (Cambridge University Press, Cambridge, UK, 1981).
48. K. A. Grosch, Proc. R. Soc. London, Ser. A 274, 21 (1963).
49. E.g., for a scan size of 1 μm the pixel size is 2 nm, by increasing the scan size to 100 μm, the resolution decreases 100 times, and the pixel size equals 200 um. In this case, sample homogeneity and roughness may influence the measured friction force data. Moreover for commercial AFM's, the highest scanning frequencies have discrete values and do not change continuously.
50. J. Fisher, D. Dowson, H. Hamdzah, and H. L. Lee, Wear 175, 219 (1994).
51. J. P. Davim and N. Marques, J. Mater. Process. Technol. 152, 389 (2004).
52. H. R. Pasaribu, J. W. Sloetjes, and D. J. Schipper, Wear 255, 699 (2003).