Comparison of thermal stability and chemical bonding configurations of plasma oxynitrided Hf and Zr thin films

Journal of the Electrochemical Society

Volumn 152, Issue 9, 2005, Pages

  Lai, Yi Sheng ^a   Lu, C H ^a   Chen, Li Min ^a   Chen, J S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHEMICAL BONDS; CRYSTALLIZATION; HAFNIUM; RAPID THERMAL ANNEALING; SILICON; TEMPERATURE DISTRIBUTION; THERMODYNAMIC STABILITY; ZIRCONIUM;

CHEMICAL BONDING; METAL FILMS; PLASMA OXYNITRIDATION;

THIN FILMS;

EID: 25644436244     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1993468     Document Type: Article

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