Exchange-diffusion reactions in HfSiON during annealing studied by Rutherford backscattering spectrometry, nuclear reaction analysis and narrow resonant nuclear reaction profiling

Applied Physics Letters

Volumn 85, Issue 19, 2004, Pages 4460-4462

  Miotti, L ^a   Bastos, K P ^a   Soares, G V ^a   Driemeier, C ^a   Pezzi, R P ^a   Morais, J ^a   Baumvol, I J R ^b   Rotondaro, A L P ^c   Visokay, M R ^c   Chambers, J J ^c   Quevedo Lopez, M ^c   Colombo, L ^c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b UNIVERSITY OF CAXIAS DO SUL   (Brazil)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EXCHANGE-DIFFUSION REACTIONS; NUCLEAR REACTION ANALYSIS; NUCLEAR REACTION PROFILING; SURFACE REGIONS;

ANNEALING; DEPOSITION; DIFFUSION; NITROGEN; NUCLEAR PROPERTIES; OXYGEN; RESONANCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS;

HAFNIUM COMPOUNDS;

EID: 10844237994     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1812814     Document Type: Conference Paper

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