Formulas for lithographic parameters when printing isolated and dense lines

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 4, 2005, Pages

  Straaijer, Alexander ^a  

^a ASML   (Netherlands)

Author keywords

Coherence; Fourier optics; Imaging; Lithography; Masks; Photoresists

Indexed keywords

COHERENT LIGHT; COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; FOURIER OPTICS; IMAGING TECHNIQUES; MASKS; PHOTORESISTS; PRINTING PROPERTIES;

AERIAL IMAGE FADING; AERIAL IMAGES; BINARY MASKS; LITHOGRAPHIC SYSTEMS;

LITHOGRAPHY;

IMAGE ANALYSIS; LITHOGRAPHY; PRINTING;

EID: 25144480690     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2140247     Document Type: Article

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