Modeling the effects of excimer laser bandwidths on lithographic performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Kroyan, Armen ^a   Bendik, Joseph ^a   Semprez, Olivier ^a   Farrar, Nigel ^a   Rowan, Chris ^a   Mack, Chris A ^a  

^a CYMER INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; BANDWIDTH; COMPUTER SIMULATION; EXCIMER LASERS; IMAGE QUALITY; MATHEMATICAL MODELS;

CHROMATIC ABERRATIONS; SOFTWARE PACKAGE PROLITH/2;

PHOTOLITHOGRAPHY;

EID: 0033697537     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)