Compact formulation of mask error factor for critical dimension control in optical lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 462-465

  Zhang, Haolin ^a   Cain, Jason ^a   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Critical dimension control; Mask error factor; Photolithography

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; MASKS; OPTICAL INSTRUMENT LENSES;

MASK ERROR FACTORS;

PHOTOLITHOGRAPHY;

EID: 0036030169     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473483     Document Type: Conference Paper

References (6)

1. J. Schoot, etc. "the mask error factor: cause and implications for process latitude" SPIE 1999, vol. 3679
2. A.K. Wong, "the mask error factor in optical lithography" IBM
3. A.K. Wong, etc, "Lithographic effects of mask critical dimension error", SPIE 1998, vol. 3334.
4. J. Randall, "Reduction of mask induced CD errors by optical proximity correction", SPIE 1998, vol. 3334.
5. F. Schellenberg, etc. "Impact of mask error on full chip error budgets" SPIE 1999, vol. 3679.
6. M. Plat, etc, "Imapct of optical enhancement techniques on the mask error enhancement function", SPIE, 2000, vol. 4000.