Determination of resist parameters using the extended Nijboer-Zernike theory

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 1, 2004, Pages 150-159

  Dirksen, Peter ^a   Braat, Joseph ^b   Janssen, Augustus J E M ^a   Leeuwestein, Ad ^a   Kwinten, Hans ^a   Van Steenwinckel, David ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Diffusion constant; Extended Nijboer Zernike theory; Focus noise; Optical lithography; Point spread function; Resist

Indexed keywords

ABERRATIONS; CONVOLUTION; IMAGE QUALITY; MASKS; MATHEMATICAL MODELS; OPTICAL INSTRUMENT LENSES; OPTICAL TRANSFER FUNCTION; PROBABILITY DENSITY FUNCTION; PROJECTION SYSTEMS; RANDOM PROCESSES; THERMAL EFFECTS;

DIFFUSED AERIAL IMAGE MODEL (DAIM); DIFFUSION CONSTANTS; EXTENDED NIJBOER-ZERNIKE THEORY; FOCUS NOISE;

PHOTORESISTS;

EID: 3843140407     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.531840     Document Type: Conference Paper

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