Process window overlap for posts and lines and spaces: Optimization by resist type, optical settings and mask bias

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3741, Issue , 1999, Pages 40-45

  Reilly, Michael T ^a   Kvam, Karen ^a   Willie, Jentry ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; MASKS;

OVERLAPPING PROCESS WINDOW (OLPW); SOFTWARE PACKAGE PROLITH;

PHOTOLITHOGRAPHY;

EID: 0032673126     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)