Defocusing image to pattern contact holes using attenuated phase shift masks

Microelectronics Journal

Volumn 34, Issue 4, 2003, Pages 237-245

  Singh, Navab ^a  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

Author keywords

Attenuated phase shift mask; Defocus; Diffraction; Rayleigh resolution

Indexed keywords

ATTENUATION; DIFFRACTION; IMAGING TECHNIQUES; MODULATION; PHASE SHIFT;

CONTACT HOLES;

MASKS;

EID: 0037381692     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2692(03)00005-3     Document Type: Article

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