Theoretical calculation of mask error enhancement factor for periodic pattern imaging

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6786-6791

  Terasawa, Tsuneo ^a   Hasegawa, Norio ^a  

^a HITACHI LTD   (Japan)

Author keywords

Imaging theory; Mask error enhancement factor (MEF); Optical lithography; Resolution enhancement

Indexed keywords

COHERENT LIGHT; ERROR CORRECTION; IMAGING TECHNIQUES; MASKS; OPTICAL RESOLVING POWER;

MASK ERROR ENHANCEMENT FACTOR (MEF);

PHOTOLITHOGRAPHY;

EID: 0034428086     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6786     Document Type: Article

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