DUV laser lithography for photomask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 30-41

  Jackson, Curt ^a   Buck, Peter ^a   Cohen, Sarah ^a   Garg, Vishal ^a   Howard, Charles ^a   Kiefer, Robert ^a   Manfredo, John ^a   Tsou, James ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

Chemically amplified resist; DUV laser lithography; Pattern fidelity

Indexed keywords

COSTS; DEGRADATION; LASERS; MATHEMATICAL MODELS; OPTIMIZATION; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR MATERIALS;

CHEMICALLY AMPLIFIED (CA) RESISTS; DUV LASER LITHOGRAPHY; PATTERN FIDELITY;

MASKS;

EID: 1842580499     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518269     Document Type: Conference Paper

References (6)

1. M. J. Bohan, H. C. Hamaker, W. Montgomery, "Implementation and characterization of a DUV raster-scanned mask pattern generation system", 21st Annual BACUS Symposium on Photomask Technology, Giang T. Dao, Brian J. Grenon, Editors, Proceedings of SPIE, Volume 4562, pp. 16-37, SPIE, (2001)
2. T. Sandstrom, P. Askebjer, J. Sallander, R. Zerne, A. Karawajczyk, "Pattern Generation with SLM Imaging", 21st Annual BACUS Symposium on Photomask Technology, Giang T. Dao, Brian J. Grenon, Editors, Proceedings of SPIE, Volume 4562, pp. 38-44, SPIE, (2001)
3. A. Buxbaum, M. Buie, B. Stoehr, W. Montgomery, S. Fuller, "Characterization of an integrated multibeam laser mask-pattern generation and dry-etch processing total solution", 21st Annual BACUS Symposium on Photomask Technology, Giang T. Dao, Brian J. Grenon, Editors, Proceedings of SPIE, Volume 4562, pp. 338-352, SPIE, (2001)
4. B. M. Rathsack, C. E. Tabery, J. A. Albelo, P. D. Buck, and C. G. Willson, "Characterization of an Acetal Based Chemically Amplified Resist for 257 nm Laser Mask Fabrication", 20sthAnnual BACUS Symposium on Photomask Technology, Giang T. Dao, Brian J. Grenon, Editors, Proceedings of SPIE, Volume 4186, pp. 578-588, SPIE, (2000)
5. J. A. Albelo, B. M. Rathsack, P. Y. Pirogovsky, "Process Development for 257nm Photomask Fabrication Using Environmentally Stable Chemical Amplified Photoresists", 20sthAnnual BACUS Symposium on Photomask Technology, Giang T. Dao, Brian J. Grenon, Editors, Proceedings of SPIE, Volume 4186, pp. 73-84, SPIE, (2000)
6. C. Spence, C. Tabery, R. Cantrell, L. Dahl, P. Buck, B. Wilkinson, "A Comparison of DUV Wafer and Reticle Lithography - What is the Resolution Limit?", 22nd Annual BACUS Symposium on Photomask Technology, Brian J. Grenon, Kurt R. Kimmel, Editors, Proceedings of SPIE, Volume 4889, pp. 177-186, SPIE (2002)