New concepts in OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5377, Issue PART 2, 2004, Pages 680-690

  Cobb, Nick ^a   Granik, Yuri ^a  

^a MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Model based; OPC; Optical flare

Indexed keywords

MODEL-BASED; OPC; OPTICAL FLARE;

ABERRATIONS; COMPUTER SOFTWARE; ERROR ANALYSIS; IMAGE ANALYSIS; INTEGRATED CIRCUIT LAYOUT; MATHEMATICAL MODELS; PHOTOGRAMMETRY; VECTORS;

PHOTOLITHOGRAPHY;

EID: 3843082767     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535605     Document Type: Conference Paper

References (7)

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2. K. Adam et al, "Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation", Proc of SPIE, vol 5040, pp 78-91 (2003).
3. K. Adam and W. Maurer, "Polarization effects in immersion lithography", Proc of SPIE, to be published, (2004).
4. Y. Granik, "Correction for etch proximity: new models and applications", Proc of SPIE, vol. 4346, pp. 98-112, (2001).
5. J. Kirk, "Scattered light in photolithographic lenses", Optical/Laser Microlithography VII, Proc. of SPIE, vol. 2197, pp. 566-572, (1994).
6. F. Schellenberg, "Design strategies for future lithography technologies (or: OPC will never die)", Proc. SPIE Vol. 5037, p. 591-598, (2003).
7. C. Mack, "Measuring and modeling flare in optical lithography", Proc of SPIE, vol. 5040, pp 151-161, (2003).