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Volumn 5752, Issue II, 2005, Pages 527-535

Design-based metrology: Advanced automation for CD-SEM recipe generation

Author keywords

CAD; CD SEM; Design based manufacturing; Design based metrology; DFM; Metrology Request; OPC model calibration; RET; SEM Automation

Indexed keywords

DESIGN FOR MANUFACTURABILITY (DFM); DESIGN-BASED METROLOGY (DBM); OPTICAL RULE CHECKS (ORC); RESOLUTION ENHANCE TECHNIQUE (RET);

EID: 24644485285     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601143     Document Type: Conference Paper
Times cited : (28)

References (6)
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    • 0036413557 scopus 로고    scopus 로고
    • Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module
    • Optical Microlithography XV, Anthony Yen; Ed. Publication Date: 7
    • Kotani, Toshiya, Kobayashi, Sachiko, Toshiba Corp.; Ichikawa, Hirotaka, Toshiba Microelectronics Corp.; Tanaka, Satoshi, Watanabe, Susumu, Inoue, Soichi, Toshiba Corp. "Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module', Proc. SPIE Vol. 4691, p. 188-195, Optical Microlithography XV, Anthony Yen; Ed. Publication Date: 7/2002.
    • (2002) Proc. SPIE , vol.4691 , pp. 188-195
    • Kotani, T.1    Kobayashi, S.2    Ichikawa, H.3    Tanaka, S.4    Watanabe, S.5    Inoue, S.6
  • 2
    • 2942633395 scopus 로고    scopus 로고
    • Combining OPC and design for printability into 65-nm logic designs
    • Proc. Design and Process Integration for Microelectronic Manufacturing II. Edited by Liebmann, Lars W. Publication Date: 6/2004
    • Lucas, Kevin D., Yuan, Chi-Min, Boone, Robert, Strozewski, Kirk, Porter, Jason, Tian, Ruiqi, Wimmer, Karl, Motorola ; Cobb, Jonathan, Wilkinson, Bill, Toublan, Olivier, 'Combining OPC and design for printability into 65-nm logic designs' Proc. Design and Process Integration for Microelectronic Manufacturing II. Edited by Liebmann, Lars W. Proceedings of the SPIE, Volume 5379, pp. 158-169 (2004). Publication Date: 6/2004.
    • (2004) Proceedings of the SPIE , vol.5379 , pp. 158-169
    • Lucas, K.D.1    Yuan, C.-M.2    Boone, R.3    Strozewski, K.4    Porter, J.5    Tian, R.6    Wimmer, K.7    Cobb, J.8    Wilkinson, B.9    Toublan, O.10
  • 3
    • 19844376164 scopus 로고    scopus 로고
    • Flexible MRC rules for OPC publication: Advanced signal processing algorithms, architectures, and implementations XIV
    • Edited by Luk, Franklin T.
    • Cobb, Nicolas B., Miloslavsky, Eugene, Lippincott, George, 'Flexible MRC rules for OPC Publication: Advanced Signal Processing Algorithms, Architectures, and Implementations XIV. Edited by Luk, Franklin T. Proceedings of the SPIE, Volume 5567, pp. 1296-1304 (2004).
    • (2004) Proceedings of the SPIE , vol.5567 , pp. 1296-1304
    • Cobb, N.B.1    Miloslavsky, E.2    Lippincott, G.3
  • 4
    • 0034547209 scopus 로고    scopus 로고
    • Automated OPC optimization using in-line CD-SEM
    • Aug Challenges in Process Integration and Device Technology; David Burnett, Shin'ichiro Kimura, Bhanwar Singh; Eds
    • Bo Su, Mina Menaker, Nadav Haas, Ramkumar Subramanian, Bhanwar Singh, 'Automated OPC optimization using in-line CD-SEM', Proc. SPIE Vol. 4181, p. 76-82, Aug 2000, Challenges in Process Integration and Device Technology; David Burnett, Shin'ichiro Kimura, Bhanwar Singh; Eds.
    • (2000) Proc. SPIE , vol.4181 , pp. 76-82
    • Su, B.1    Menaker, M.2    Haas, N.3    Subramanian, R.4    Singh, B.5
  • 6
    • 0036031381 scopus 로고    scopus 로고
    • Validation of the aberration-pattern-matching OPC strategy
    • 'Design, Process Integration and Characterization for Microelectronics'
    • F. Gennari, G. Robins and Andrew Neureuther, 'Validation of the aberration-pattern-matching OPC strategy', Proc. SPIE Vol. 4692, 2002 'Design, Process Integration and Characterization for Microelectronics'.
    • (2002) Proc. SPIE , vol.4692
    • Gennari, F.1    Robins, G.2    Neureuther, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.