-
1
-
-
0036413557
-
Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module
-
Optical Microlithography XV, Anthony Yen; Ed. Publication Date: 7
-
Kotani, Toshiya, Kobayashi, Sachiko, Toshiba Corp.; Ichikawa, Hirotaka, Toshiba Microelectronics Corp.; Tanaka, Satoshi, Watanabe, Susumu, Inoue, Soichi, Toshiba Corp. "Advanced hybrid optical proximity correction system with OPC segment library and model-based correction module', Proc. SPIE Vol. 4691, p. 188-195, Optical Microlithography XV, Anthony Yen; Ed. Publication Date: 7/2002.
-
(2002)
Proc. SPIE
, vol.4691
, pp. 188-195
-
-
Kotani, T.1
Kobayashi, S.2
Ichikawa, H.3
Tanaka, S.4
Watanabe, S.5
Inoue, S.6
-
2
-
-
2942633395
-
Combining OPC and design for printability into 65-nm logic designs
-
Proc. Design and Process Integration for Microelectronic Manufacturing II. Edited by Liebmann, Lars W. Publication Date: 6/2004
-
Lucas, Kevin D., Yuan, Chi-Min, Boone, Robert, Strozewski, Kirk, Porter, Jason, Tian, Ruiqi, Wimmer, Karl, Motorola ; Cobb, Jonathan, Wilkinson, Bill, Toublan, Olivier, 'Combining OPC and design for printability into 65-nm logic designs' Proc. Design and Process Integration for Microelectronic Manufacturing II. Edited by Liebmann, Lars W. Proceedings of the SPIE, Volume 5379, pp. 158-169 (2004). Publication Date: 6/2004.
-
(2004)
Proceedings of the SPIE
, vol.5379
, pp. 158-169
-
-
Lucas, K.D.1
Yuan, C.-M.2
Boone, R.3
Strozewski, K.4
Porter, J.5
Tian, R.6
Wimmer, K.7
Cobb, J.8
Wilkinson, B.9
Toublan, O.10
-
3
-
-
19844376164
-
Flexible MRC rules for OPC publication: Advanced signal processing algorithms, architectures, and implementations XIV
-
Edited by Luk, Franklin T.
-
Cobb, Nicolas B., Miloslavsky, Eugene, Lippincott, George, 'Flexible MRC rules for OPC Publication: Advanced Signal Processing Algorithms, Architectures, and Implementations XIV. Edited by Luk, Franklin T. Proceedings of the SPIE, Volume 5567, pp. 1296-1304 (2004).
-
(2004)
Proceedings of the SPIE
, vol.5567
, pp. 1296-1304
-
-
Cobb, N.B.1
Miloslavsky, E.2
Lippincott, G.3
-
4
-
-
0034547209
-
Automated OPC optimization using in-line CD-SEM
-
Aug Challenges in Process Integration and Device Technology; David Burnett, Shin'ichiro Kimura, Bhanwar Singh; Eds
-
Bo Su, Mina Menaker, Nadav Haas, Ramkumar Subramanian, Bhanwar Singh, 'Automated OPC optimization using in-line CD-SEM', Proc. SPIE Vol. 4181, p. 76-82, Aug 2000, Challenges in Process Integration and Device Technology; David Burnett, Shin'ichiro Kimura, Bhanwar Singh; Eds.
-
(2000)
Proc. SPIE
, vol.4181
, pp. 76-82
-
-
Su, B.1
Menaker, M.2
Haas, N.3
Subramanian, R.4
Singh, B.5
-
5
-
-
0035465564
-
TCAD development for lithography resolution enhancement
-
Advanced Semiconductor Lithography
-
L.W. Liebman, S.M. Mansfield, A.K.Wong, W.C. Leipold and T.G. Dunham, 'TCAD development for lithography resolution enhancement, IBM Journal of Research and Development' volume 45, number 5, 2001, Advanced Semiconductor Lithography.
-
(2001)
IBM Journal of Research and Development
, vol.45
, Issue.5
-
-
Liebman, L.W.1
Mansfield, S.M.2
Wong, A.K.3
Leipold, W.C.4
Dunham, T.G.5
-
6
-
-
0036031381
-
Validation of the aberration-pattern-matching OPC strategy
-
'Design, Process Integration and Characterization for Microelectronics'
-
F. Gennari, G. Robins and Andrew Neureuther, 'Validation of the aberration-pattern-matching OPC strategy', Proc. SPIE Vol. 4692, 2002 'Design, Process Integration and Characterization for Microelectronics'.
-
(2002)
Proc. SPIE
, vol.4692
-
-
Gennari, F.1
Robins, G.2
Neureuther, A.3
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