Use of design pattern layout for automated metrology recipe generation

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue III, 2005, Pages 1424-1434

  Tabery, Cyrus ^a   Page, Lorena ^b  

^a One AMD Place   (United States)

^b Hitachi High Technologies America   (United States)

Author keywords

Automatic recipe creation; CD SEM; Design Gauge; Metrology request; OPC; Pattern matching; SEM image analysis

Indexed keywords

AUTOMATIC RECIPE CREATION; CD-SEM; DESIGN GAUGE; METROLOGY REQUEST; OPC; SEM IMAGE ANALYSIS;

AUTOMATION; CALIBRATION; DIMENSIONAL STABILITY; ERRORS; LITHOGRAPHY; MATHEMATICAL MODELS; MEASUREMENTS; SCANNING ELECTRON MICROSCOPY;

PATTERN MATCHING;

EID: 24644448785     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.610663     Document Type: Conference Paper

References (0)