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Volumn 4889, Issue 1, 2002, Pages 50-58
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Process bias control with thin Cr film blanks for 90nm-node reticle fabrication
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Author keywords
ArF lithography; Dry etching; Etching bias; Thin Cr film blanks
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Indexed keywords
CHROMIUM;
COMPUTER SIMULATION;
DRY ETCHING;
LITHOGRAPHY;
METALLIC FILMS;
RETICLE FABRICATION;
THIN FILMS;
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EID: 0037966884
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.467497 Document Type: Conference Paper |
Times cited : (13)
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References (5)
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