Impact of lithography variability on statistical timing behavior

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5379, Issue , 2004, Pages 101-110

  Progler, Christopher ^a   Borna, Amir ^b   Blaauw, David ^b   Sixt, Pierre ^a  

^a PHOTRONICS INC   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Lithography variability; Simulation; Timing

Indexed keywords

LITHOGRAPHY VARIABILITY; NUMERICAL MODELS; STATISTICAL MODELING; TIMING;

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; LOGIC CIRCUITS; MASKS; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; MONTE CARLO METHODS; OPTIMIZATION; TIMING CIRCUITS;

LITHOGRAPHY;

EID: 2942674847     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.537259     Document Type: Conference Paper

References (8)

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