Advanced timing analysis based on post-OPC patterning process simulations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5756, Issue , 2005, Pages 189-197

  Yang, Jie ^a,b   Capodieci, Luigi ^b   Sylvester, Dennis ^a  

^a University of Michigan   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Design flow; DFM; Layout; OPC; Process variation; Timing analysis

Indexed keywords

DESIGN FLOW; DESIGN FOR MANUFACTURABILITY (DFM); OPTICAL PROXIMITY CORRECTION (OPC); PROCESS VARIATION; TIMING ANALYSIS;

COMPUTER SIMULATION; ERROR ANALYSIS; INTEGRATED CIRCUIT LAYOUT; PROCESS CONTROL;

OPTICAL SYSTEMS;

EID: 24644494019     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.604567     Document Type: Conference Paper

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