Quarter-micron chemically amplified reaction image determination using arrested development

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2627-2631

  Rhyner, Steven J ^a   Taylor, James W ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4143103711     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589697     Document Type: Article

References (16)

1. T. H. Fedynyshyn, J. W. Thackeray, J. H. Georger, and M. D. Denison, J. Vac. Sci. Technol. B 12, 3888 (1994).
2. R. A. Ferguson, J. M. Hutchinson, C. A. Spence, and A. R. Neureuther, J. Vac. Sci. Technol. B 8, 1423 (1990).
3. W. G. Oldham, S. N. Nandgaonkar, A. R. Neureuther, and M. M. O'Toole, IEEE Trans. Electron Devices ED-26, 717 (1979).
4. C. M. Garza and S. P. Grindle, Proc. SPIE 631, 117 (1986).
5. C. Mack, Proc. SPIE 538, 207 (1985).
6. M. deGrandpre, K. Graziano, S. D. Thompson, H.-Y. Liu, and L. Blum, Proc. SPIE 923, 158 (1988).
7. C. Nelson, Ph.D. thesis, University of Wisconsin-Madison, 1996.
8. P. G. Drennan, B. W. Smith, and D. Alexander, Proc. SPIE 2196, 449 (1994).
9. F. Cerrina, F. Baszler, S. Turner, and M. Khan, Microelectron. Eng. 21, 103 (1993).
10. R. E. Jewett, P. I. Hagouel, A. R. Neureuther, and T. Van Duzer, Polym. Eng. Sci. 17, 381 (1977).
11. L. E. Ocola, D. Fryer, P. Nealey, J. dePablo, F. Cerrina, and S. Kammer, J. Vac. Sci. Technol. B 14, 3974 (1996).
12. R. A. Arcus, Proc. SPIE 631, 124 (1986).
13. H.-Y. Shih and A. Reiser, Proc. SPIE 2195, 514 (1994).
14. T. H. Fedynyshyn, M. F. Cronin, L. C. Poli, and C. J. Kondek, J. Vac. Sci. Technol. B 8, 1454 (1990).
15. T. H. Fedynyshyn, C. R. Szmanda, R. F. Blacksmith, and W. E. Houck, Proc. SPIE 1925, 2 (1993).
16. J. M. Hutchinson, S. Das, Q.-D. Qian, and H. Gaw, Opt. Eng. (Bellingham) 32, 2395 (1993).