Metrology methods for the Quantification of edge-roughness

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 19-29

  Nelson, Carla M ^a   Palmateer, Susan C ^a   Lyszczarz, Ted ^a  

^a SEMATECH   (United States)

Author keywords

AFM; CD metrology; Edge Roughness; Line Edge Roughness (LER); SEM; Top Surface Imaging (TSI)

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIGITAL INSTRUMENTS; IMAGING TECHNIQUES; OPTICAL RESOLVING POWER; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE ROUGHNESS;

CRITICAL DIMENSIONS (CD); EDGE ROUGHNESS;

LITHOGRAPHY;

EID: 0032403802     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308735     Document Type: Conference Paper

References (20)