Simulation of X-ray mask defect printability

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 155-166

  Bollepalli, B S ^a   Hector, Scott D ^b   Maldonado, Juan R ^c   Leavey, Jeff ^c   Cerrina, Franco ^a   Khan, Mumit ^a  

^a University of Wisconsin Madison   (United States)

^b MOTOROLA INC   (United States)

^c IBM RESEARCH   (United States)

Author keywords

Defects; Pellicle defects; Phase shifting properties; X ray masks

Indexed keywords

DEFECTS; MASKS; NITROGEN COMPOUNDS; POLYMETHYL METHACRYLATES; SPHERES; SULFUR COMPOUNDS; X RAY LITHOGRAPHY;

ADVANCED LITHOGRAPHY; DEFECT PRINTABILITY; FABRICATION DEFECTS; IMAGE FORMATION MODELS; PHASE-SHIFTING; UNIVERSITY OF CALIFORNIA; UNIVERSITY OF WISCONSIN; X RAY MASK;

X RAYS;

EID: 85076455866     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275772     Document Type: Conference Paper

References (4)

1. C. Capasso, "X-ray induced mask contamination and particulate monitoring in X-ray steppers," J. Vac. Sci. Technol. B 14(6), pp. 4336-, 1996.
2. P. G. Blauner and J. Mauer, "X-ray mask repair," IBM J. RES5 DEVELOP. 37 No. 3, pp. 421-434, 1993.
3. T. S. A. Kluwe, H. Lutzke and K. H. Muller, "Printability of X-ray mask defects at various printing conditions and critical dimensions," J. Vac. Sci. Technol. B 8(6), pp. 1609-1613, 1990.
4. J. Sethian, "A fast marching level set method for monotonically advancing fronts," Centre for Pure & Applied Mathematics, UC Berkeley, report PAM-652