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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3709-3715

Chemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications

(5) Petrillo, Karen a Bucchignano, James a Angelopoulos, Marie a Cornett, Kathleen b Brunsvold, William b

a IBM T J WATSON RESEARCH CENTER (United States)

b IBM MICROELECTRONICS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004025106 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.590395 Document Type: Article

Times cited : (7)

References (14)

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