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Volumn 5277, Issue , 2004, Pages 90-98

Structural and optical properties of indium nitride grown by plasma assisted molecular beam epitaxy

Author keywords

Indium nitride; InN; PAMBE; Plasma assisted molecular beam epitaxy

Indexed keywords

LIGHT EMITTING DIODES; LUMINESCENCE; MOLECULAR BEAM EPITAXY; MORPHOLOGY; OXYGEN; POLYCRYSTALLINE MATERIALS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SAPPHIRE; SILICA; SINGLE CRYSTALS;

EID: 2442516110     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.522852     Document Type: Conference Paper
Times cited : (4)

References (18)
  • 2
    • 0000038685 scopus 로고
    • Optical band gap of indium nitride
    • T.L. Tansley and C.P. Foley, "Optical band gap of indium nitride", J. Appl. Phys. 59, 3241-3244, 1986.
    • (1986) J. Appl. Phys. , vol.59 , pp. 3241-3244
    • Tansley, T.L.1    Foley, C.P.2
  • 7
    • 9944232853 scopus 로고    scopus 로고
    • Visible emissions near 2.2 eV from InN films grown on Si (111) and sapphire (0001) substrates by electron cyclotron resonance plasma-assisted molecular-beam epitaxy
    • to be published. (DOI: 10.1002/pssc.200303452)
    • T. Yodo, H. Yona, Y. Harada, A. Sasaki and M. Yoshimoto, "Visible emissions near 2.2 eV from InN films grown on Si (111) and sapphire (0001) substrates by electron cyclotron resonance plasma-assisted molecular-beam epitaxy", Phys. Stat. Solidi B, to be published, 2003. (DOI: 10.1002/pssc.200303452).
    • (2003) Phys. Stat. Solidi B
    • Yodo, T.1    Yona, H.2    Harada, Y.3    Sasaki, A.4    Yoshimoto, M.5
  • 8
    • 0035541042 scopus 로고    scopus 로고
    • Growth and characterization of InN heteroepitaxial layers grown on Si substrates by ECR-assisted MBE
    • T. Yodo, H. Ando, D. Nosei and Y. Harada, "Growth and Characterization of InN Heteroepitaxial Layers Grown on Si Substrates by ECR-Assisted MBE", Phys. Stat. Solidi B 228, 21-26, 2001.
    • (2001) Phys. Stat. Solidi B , vol.228 , pp. 21-26
    • Yodo, T.1    Ando, H.2    Nosei, D.3    Harada, Y.4
  • 9
    • 0037451297 scopus 로고    scopus 로고
    • Surface charge accumulation of InN films grown by molecular-beam epitaxy
    • H. Lu, W.J. Schaff, L.F. Eastman and C. E. Stutz, "Surface charge accumulation of InN films grown by molecular-beam epitaxy", Appl. Phys. Lett. 82, 1736-1738, 2003.
    • (2003) Appl. Phys. Lett. , vol.82 , pp. 1736-1738
    • Lu, H.1    Schaff, W.J.2    Eastman, L.F.3    Stutz, C.E.4
  • 10
    • 0141608080 scopus 로고    scopus 로고
    • Indium nitride (InN): A review on growth, characterization, and properties
    • A.G. Bhuiyan, A. Hashimoto and A. Yamamoto, "Indium nitride (InN): A review on growth, characterization, and properties", J. Appl. Phys. 94, 2779-2808, 2003.
    • (2003) J. Appl. Phys. , vol.94 , pp. 2779-2808
    • Bhuiyan, A.G.1    Hashimoto, A.2    Yamamoto, A.3
  • 12
    • 4043173098 scopus 로고    scopus 로고
    • Gas source molecular beam epitaxy of wurtzite GaN on sapphire substrates using GaN buffer layers
    • N. Grandjean, M. Leroux, M. Laügt, and J. Massies, "Gas source molecular beam epitaxy of wurtzite GaN on sapphire substrates using GaN buffer layers", Appl. Phys. Lett. 71, 240-242, 1997.
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 240-242
    • Grandjean, N.1    Leroux, M.2    Laügt, M.3    Massies, J.4
  • 13
    • 0000382944 scopus 로고    scopus 로고
    • "Nitridation of sapphire. Effect on the optical properties of GaN epitaxial overlayers
    • N. Grandjean, J. Massies, and M. Leroux, "Nitridation of sapphire. Effect on the optical properties of GaN epitaxial overlayers", Appl. Phys. Lett. 69, 2071-1073, 1996.
    • (1996) Appl. Phys. Lett. , vol.69 , pp. 2071-1073
    • Grandjean, N.1    Massies, J.2    Leroux, M.3
  • 15
    • 0035998574 scopus 로고    scopus 로고
    • Role of low-temperature (200°C) nitridation in the growth of GaN by plasma-assisted molecular-beam epitaxy
    • G. Namkoong, W.A. Doolittle, A.S. Brown, M. Losurdo, P. Capezzuto and G. Bruno, "Role of low-temperature (200°C) nitridation in the growth of GaN by plasma-assisted molecular-beam epitaxy", J. Vac. Sci. Technol. B 20, 1221-1228, 2002.
    • (2002) J. Vac. Sci. Technol. B , vol.20 , pp. 1221-1228
    • Namkoong, G.1    Doolittle, W.A.2    Brown, A.S.3    Losurdo, M.4    Capezzuto, P.5    Bruno, G.6
  • 16
    • 0037098087 scopus 로고    scopus 로고
    • Dynamically stable gallium surface coverages during plasma-assisted molecular-beam epitaxy of (0001) GaN
    • C. Adelmann, J. Brault, D. Jalabert, P. Gentile, H. Mariette, G. Mula and B. Daudin, "Dynamically stable gallium surface coverages during plasma-assisted molecular-beam epitaxy of (0001) GaN", J. Appl. Phys. 91, 9638-9645, 2002.
    • (2002) J. Appl. Phys. , vol.91 , pp. 9638-9645
    • Adelmann, C.1    Brault, J.2    Jalabert, D.3    Gentile, P.4    Mariette, H.5    Mula, G.6    Daudin, B.7
  • 17
    • 0011796924 scopus 로고    scopus 로고
    • Control of GaN surface morphologies using plasma-assisted molecular beam epitaxy
    • B. Heying, R. Averbeck, L.F. Chen, E. Haus, H. Riechert and J. S. Speck, "Control of GaN surface morphologies using plasma-assisted molecular beam epitaxy", J. Appl. Phys. 88, 1855-1860, 2000.
    • (2000) J. Appl. Phys. , vol.88 , pp. 1855-1860
    • Heying, B.1    Averbeck, R.2    Chen, L.F.3    Haus, E.4    Riechert, H.5    Speck, J.S.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.